Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning
Vos, Rita; Lux, Marcel; Arnauts, Sophia; Kenis, Karine; Maes, M.; Onsia, Bart; Snow, James; Holsteyns, Frank; Vereecke, Guy; Mertens, Paul W.; Heyns, Marc M.; Doll, O.; Fester, A.; Kolbesen, Bernd O.; Hackett, T.; Hoffman, Mark
- 期刊名称Solid State Phenomena
- 作者Vos, Rita; Lux, Marcel; Arnauts, Sophia; Kenis, Karine; Maes, M.; Onsia, Bart; Snow, James; Holsteyns, Frank; Vereecke, Guy; Mertens, Paul W.; Heyns, Marc M.; Doll, O.; Fester, A.; Kolbesen, Bernd O.; Hackett, T.; Hoffman, Mark
- 卷第92卷
- 电子ISSN1662-9779
- 文件大小443.43KB
- 发表时间2003
- DOI10.4028/www.scientific.net/SSP.92.27
- 页码27-32