Nickel electroless deposition process on chemically pretreated Si(100) wafers in aqueous alkaline solution
- 作者Daisuke Niwa; Nao Takano; Taro Yamada; Tetsuya Osaka
- 卷第48卷
- 期第9期
- 印刷ISSN0013-4686
- 文件大小553.16KB
- 发表时间2003
- DOI10.1016/s0013-4686(02)00838-1
- 页码1295-1300
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