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Dislocation-free Czochralski Si crystal growth without a thin neck: dislocation behavior due to incomplete seeding

Dislocation-free Czochralski Si crystal growth without a thin neck: dislocation behavior due to incomplete seeding

Toshinori Taishi; Xinming Huang; Ichiro Yonenaga; Keigo Hoshikawa
  • 作者Toshinori Taishi; Xinming Huang; Ichiro Yonenaga; Keigo Hoshikawa
  • 卷第258卷
  • 印刷ISSN0022-0248
  • 文件大小237.16KB
  • 发表时间2003
  • DOI10.1016/s0022-0248(03)01501-x
  • 页码58-64
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