Patients with Essential Hypertension Present Higher Levels of sE‐Selectin and sVCAM‐1 Than Normotensive Volunteers
- 期刊名称Clinical and Experimental Hypertension
- 作者Palomo, Iván; Marín, Patricio; Alarcón, Marcelo; Gubelin, Gilda; Viñambre, Ximena; Mora, Eduardo; Icaza, Gloria
- 卷第25卷
- 期第8期
- 印刷ISSN1064-1963
- 电子ISSN1525-6006
- 文件大小71.20KB
- 发表时间2003-01
- DOI10.1081/ceh-120025335
- 页码517-523
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Solving inverse problems of optical microlithographyGranik, Yuri; Smith, Bruce W. · 2005
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Photoresist modulation curvesBourov, Anatoly; Smith, Bruce W.; Fan, Yongfa; Cropanese, Frank C.; Smith, Bruce W. · 2005
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - <title>Thirty years of lithography simulation</title>Mack, Chris A.; Smith, Bruce W. · 2005
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Simulations of immersion lithographyBai, Min; Smith, Bruce W.; Lei, Junjiang; Zhang, Lin; Shiely, James P. · 2005
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Technology qualification for 65-nm nodeTyminski, Jacek K.; Smith, Bruce W.; Nakashima, Toshiharu · 2005
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - What makes a coherence curve change?Renwick, Stephen P.; Smith, Bruce W. · 2005
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Polarization influences through the optical pathBailey, George E.; Smith, Bruce W.; Adam, Kostas · 2005
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - A 157-nm immersion microstepperSwitkes, M.; Smith, Bruce W.; Bloomstein, T. M.; Rothschild, M.; Arriola, E. W.; Morrison, T. H. · 2005