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Predicting critical dimension uniformity in advanced electron-beam projection lithography masks

Predicting critical dimension uniformity in advanced electron-beam projection lithography masks

E. P. Cotte; A. R. Mikkelson; O. Matesanz; R. L. Engelstad; E. G. Lovell; P. L. Reu
  • 作者E. P. Cotte; A. R. Mikkelson; O. Matesanz; R. L. Engelstad; E. G. Lovell; P. L. Reu
  • 文件大小1039.46KB
  • 发表时间2003
  • DOI10.1116/1.1614251
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