Miniaturization of a Thermally Driven Ni|Si Bimorph
- 期刊名称Japanese Journal of Applied Physics
- 作者Tomonari, Shigeaki; Yoshida, Hitoshi; Kamakura, Masanao; Yoshida, Kazushi; Kawahito, Keiko; Saitoh, Masaaki; Kawada, Hiroshi; Juodkazis, Saulius; Misawa, Hiroaki
- 卷第42卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小545.88KB
- 发表时间2003-7-15
- DOI10.1143/JJAP.42.4464
- 页码4464-4468
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