Photocatalytic Characteristics of TiO 2 Thin Films Prepared by Dc Reactive Magnetron Sputtering with added H 2 O
- 期刊名称Japanese Journal of Applied Physics
- 作者Noguchi, Daisuke; Kawamata, Yoshio; Nagatomo, Takao
- 卷第42卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小133.96KB
- 发表时间2003-8-15
- DOI10.1143/JJAP.42.5255
- 页码5255-5258
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