Quantitative depth profiling of nitrogen in ultrathin oxynitride film with low energy SIMS
- 作者H.K. Shon; H.J. Kang; T.E. Hong; H.S. Chang; K.J. Kim; H.K. Kim; D.W. Moon
- 印刷ISSN0169-4332
- 文件大小260.51KB
- 发表时间2003
- DOI10.1016/s0169-4332(02)00693-1
- 页码423-426
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