Characterization of chemically-deposited NiB and NiWB thin films as a capping layer for ULSI application

• 作者Tetsuya Osaka; Nao Takano; Tetsuya Kurokawa; Tomomi Kaneko; Kazuyoshi Ueno
• 印刷ISSN0257-8972
• 文件大小445.98KB
• 发表时间2003
• DOI10.1016/s0257-8972(03)00186-5
• 页码124-127