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The Study of Modified Layers in SiCOH Dielectrics using Spectroscopic Ellipsometry

The Study of Modified Layers in SiCOH Dielectrics using Spectroscopic Ellipsometry

Worsley, Marcus A.; Bent, Stacey F.; Gates, Stephen M.; Kumar, Kaushik; Dalton, Timothy; Hedrick, Jeffrey C.
  • 期刊名称MRS Proceedings
  • 作者Worsley, Marcus A.; Bent, Stacey F.; Gates, Stephen M.; Kumar, Kaushik; Dalton, Timothy; Hedrick, Jeffrey C.
  • 卷第766卷
  • 印刷ISSN0272-9172
  • 电子ISSN1946-4274
  • 文件大小145.38KB
  • 发表时间2003
  • DOI10.1557/PROC-766-E3.29
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