Accurate electrical activation characterization of CMOS ultra-shallow profiles

T. Clarysse; F. Dortu; D. Vanhaeren; I. Hoflijk; L. Geenen; T. Janssens; R. Loo; W. Vandervorst; B.J. Pawlak; V. Ouzeaud; C. Defranoux; V.N. Faifer; M.I. Current

作者T. Clarysse; F. Dortu; D. Vanhaeren; I. Hoflijk; L. Geenen; T. Janssens; R. Loo; W. Vandervorst; B.J. Pawlak; V. Ouzeaud; C. Defranoux; V.N. Faifer; M.I. Current
印刷ISSN0921-5107
文件大小220.17KB
发表时间2004
DOI10.1016/j.mseb.2004.07.047
页码166-173

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Accurate electrical activation characterization of CMOS ultra-shallow profiles