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Properties of c-C[sub 4]F[sub 8] inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C[sub 4]F[sub 8]/O[sub 2] discharges

Properties of c-C[sub 4]F[sub 8] inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C[sub 4]F[sub 8]/O[sub 2] discharges

Vasenkov, Alex V.; Li, Xi; Oehrlein, Gottlieb S.; Kushner, Mark J.

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Vasenkov, Alex V.; Li, Xi; Oehrlein, Gottlieb S.; Kushner, Mark J.
卷第22卷
期第3期
印刷ISSN0734-2101
文件大小578.84KB
发表时间2004
DOI10.1116/1.1697483

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