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Structure evolution and ferroelectric and dielectric properties of Bi[sub 3.5]Nd[sub 0.5]Ti[sub 3]O[sub 12] thin films under a moderate temperature annealing

Structure evolution and ferroelectric and dielectric properties of Bi[sub 3.5]Nd[sub 0.5]Ti[sub 3]O[sub 12] thin films under a moderate temperature annealing

Zhong, X. L.; Wang, J. B.; Zheng, X. J.; Zhou, Y. C.; Yang, G. W.

期刊名称Applied Physics Letters
作者Zhong, X. L.; Wang, J. B.; Zheng, X. J.; Zhou, Y. C.; Yang, G. W.
卷第85卷
期第23期
印刷ISSN0003-6951
文件大小311.37KB
发表时间2004
DOI10.1063/1.1834731

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