Electrical activation in silicon-on-insulator after low energy boron implantation
Saavedra, Antonio F.; Jones, Kevin S.; Law, Mark E.; Chan, Kevin K.; Jones, Erin C.
- 期刊名称Journal of Applied Physics
- 作者Saavedra, Antonio F.; Jones, Kevin S.; Law, Mark E.; Chan, Kevin K.; Jones, Erin C.
- 卷第96卷
- 期第4期
- 印刷ISSN0021-8979
- 文件大小1105.22KB
- 发表时间2004
- DOI10.1063/1.1769095