Erratum to “Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering” [J. Crystal Growth 253 (2003) 117–128]

• 作者R.J. Hong; X. Jiang; B. Szyszka; V. Sittinger; S.H. Xu; W. Werner; G. Heide
• 卷第260卷
• 印刷ISSN0022-0248
• 文件大小135.25KB
• 发表时间2004
• DOI10.1016/j.jcrysgro.2003.10.085