Deposition of Copper Thin Films on Titanium Nitride Layer Prepared by Flow Modulation CVD Technology
Cho, Nam Ihn; Kim, Min Chul; Rim, Kyung Hwa; Chang, Ho Jung; Jun, Keeyoung; Shimogaki, Yukihiro
- 期刊名称Materials Science Forum
- 作者Cho, Nam Ihn; Kim, Min Chul; Rim, Kyung Hwa; Chang, Ho Jung; Jun, Keeyoung; Shimogaki, Yukihiro
- 电子ISSN1662-9752
- 文件大小1401.29KB
- 发表时间2004
- DOI10.4028/www.scientific.net/MSF.449-452.457
- 页码457-460