Investigation of the chemical state of ultrathin Hf–Al–O films during high temperature annealing

M.-H. Cho; H.S. Chang; Y.J. Cho; D.W. Moon; K.-H. Min; R. Sinclair; S.K. Kang; D.-H. Ko; J.H. Lee; J.H. Gu; N.I. Lee

作者M.-H. Cho; H.S. Chang; Y.J. Cho; D.W. Moon; K.-H. Min; R. Sinclair; S.K. Kang; D.-H. Ko; J.H. Lee; J.H. Gu; N.I. Lee
卷第554卷
期第1期
印刷ISSN0039-6028
文件大小487.69KB
发表时间2004
DOI10.1016/j.susc.2004.01.058

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