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Positive and negative patterning of ethanethiol, decanethiol, and hexadecanethiol self-assembled monolayers by using a metastable helium beam

Positive and negative patterning of ethanethiol, decanethiol, and hexadecanethiol self-assembled monolayers by using a metastable helium beam

Ju Xin; Kurahashi Mitsunori; Suzuki Taku; Yamauchi Yasushi

作者Ju Xin; Kurahashi Mitsunori; Suzuki Taku; Yamauchi Yasushi
印刷ISSN0040-6090
文件大小272.19KB
发表时间2004
DOI10.1016/j.tsf.2004.06.119
页码420-424

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