Transport Considerations in the Plasma-Assisted Oxidation of Copper Films
- 期刊名称Journal of The Electrochemical Society
- 作者Li, Yiming; Hess, Dennis W.
- 卷第151卷
- 期第1期
- 印刷ISSN0013-4651
- 文件大小148.47KB
- 发表时间2004
- DOI10.1149/1.1630039
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