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Room Temperature Halogenation of Polyimide Film Surface using Chlorine Trifluoride Gas

Room Temperature Halogenation of Polyimide Film Surface using Chlorine Trifluoride Gas

H. Habuka; T. Kosuga; K. Koike; T. Aida; T. Takeuchi; M. Aihara

作者H. Habuka; T. Kosuga; K. Koike; T. Aida; T. Takeuchi; M. Aihara
文件大小191.35KB
发表时间2004
DOI10.1143/JJAP.43.730

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