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Control of Selectivity between SiGe and Si in Isotropic Etching Processes

Control of Selectivity between SiGe and Si in Isotropic Etching Processes

S. Borel; C. Arvet; J. Bilde; V. Caubet; D. Louis
  • 作者S. Borel; C. Arvet; J. Bilde; V. Caubet; D. Louis
  • 文件大小416.64KB
  • 发表时间2004
  • DOI10.1143/JJAP.43.3964
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