![Mist chemical vapor deposition study on a 20 nm thick undoped ferroelectric hafnium oxide film on n<sup>+</sup>-Si(100) substrate]()
Mist chemical vapor deposition study on a 20 nm thick undoped ferroelectric hafnium oxide film on n<sup>+</sup>-Si(100) substrateTahara, Daisuke Male; NISHINAKA, Hiroyuki; Sato, Shota; Li, Liu; Kawaharamura, Toshiyuki; YOSHIMOTO, Masahiro; Noda, Minoru · Japanese Journal of Applied Physics · 2019