发现好书期刊,享受阅读乐趣

海量图书期刊资源,随时随地畅享阅读乐趣

Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers

Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers

Hellin, D.; Rip, J.; Geens, V.; Delande, T.; Conard, T.; De Gendt, S.; Vinckier, C.
  • 期刊名称Journal of Analytical Atomic Spectrometry
  • 作者Hellin, D.; Rip, J.; Geens, V.; Delande, T.; Conard, T.; De Gendt, S.; Vinckier, C.
  • 卷第20卷
  • 期第7期
  • 印刷ISSN0267-9477
  • 电子ISSN1364-5544
  • 文件大小745.80KB
  • 发表时间2005
  • DOI10.1039/b502208h
← 返回【学霸图书馆】主页