[IEEE ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005. - San Jose, CA, USA (2005.09.13-2005.09.15)] ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005. - Analysis of low metallic contamination on silicon wafer surfaces by VPT-TXRF - quantification of 10/sup 9/ atoms/cm/sup 2/ level contamination
Shimazaki, A.; Ito, S.; Miyazaki, K.; Matsumura, T.
- 作者Shimazaki, A.; Ito, S.; Miyazaki, K.; Matsumura, T.
- 文件大小726.49KB
- 发表时间2005
- DOI10.1109/issm.2005.1513404
- 页码456-459