Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor Applications

Kim, Wan Don; Hwang, Gyu Weon; Kwon, Oh Seong; Kim, Seong Keun; Cho, Moonju; Jeong, Doo Seok; Lee, Sang Woon; Seo, Min Ha; Hwang, Cheol Seong; Min, Yo-Sep; Cho, Young Jin

期刊名称Journal of The Electrochemical Society
作者Kim, Wan Don; Hwang, Gyu Weon; Kwon, Oh Seong; Kim, Seong Keun; Cho, Moonju; Jeong, Doo Seok; Lee, Sang Woon; Seo, Min Ha; Hwang, Cheol Seong; Min, Yo-Sep; Cho, Young Jin
卷第152卷
期第8期
印刷ISSN0013-4651
文件大小535.88KB
发表时间2005
DOI10.1149/1.1943589

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Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor Applications