Atomistic analysis of the evolution of boron activation during annealing in crystalline and preamorphized silicon
- 期刊名称Journal of Applied Physics
- 作者Aboy, Maria; Pelaz, Lourdes; Marqués, Luis A.; López, Pedro; Barbolla, Juan; Duffy, R.
- 卷第97卷
- 期第10期
- 印刷ISSN0021-8979
- 文件大小341.83KB
- 发表时间2005
- DOI10.1063/1.1904159
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