Influence of the oxygen concentration of atomic-layer-deposited HfO[sub 2] films on the dielectric property and interface trap density
Park, Jaehoo; Cho, Moonju; Kim, Seong Keun; Park, Tae Joo; Lee, Suk Woo; Hong, Sug Hun; Hwang, Cheol Seong
- 期刊名称Applied Physics Letters
- 作者Park, Jaehoo; Cho, Moonju; Kim, Seong Keun; Park, Tae Joo; Lee, Suk Woo; Hong, Sug Hun; Hwang, Cheol Seong
- 卷第86卷
- 期第11期
- 印刷ISSN0003-6951
- 文件大小410.38KB
- 发表时间2005
- DOI10.1063/1.1885167