Investigation of methods for doping CZ silicon with gallium
Takeshi Hoshikawa; Toshinori Taishi; Shuji Oishi; Keigo Hoshikawa
- 作者Takeshi Hoshikawa; Toshinori Taishi; Shuji Oishi; Keigo Hoshikawa
- 卷第275卷
- 印刷ISSN0022-0248
- 文件大小198.04KB
- 发表时间2005
- DOI10.1016/j.jcrysgro.2004.11.286