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Effects of Low-temperature NH[sub 3] Treatment on the Characteristics of HfO[sub 2]∕SiO[sub 2] Gate Stack

Lu, Wen-Tai; Chien, Chao-Hsin; Huang, Ing-Jye; Yang, Ming-Jui; Lehnen, Peer; Huang, Tiao-Yuan

期刊名称Journal of The Electrochemical Society
作者Lu, Wen-Tai; Chien, Chao-Hsin; Huang, Ing-Jye; Yang, Ming-Jui; Lehnen, Peer; Huang, Tiao-Yuan
卷第152卷
期第11期
印刷ISSN0013-4651
文件大小541.25KB
发表时间2005
DOI10.1149/1.2039629