![SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - <title>Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator</title>]()
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - <title>Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator</title>McIntyre, Gregory; Corliss, Daniel; Groenendijk, Remco; Carpaij, Rene; van Niftrik, Ton; Landie, Guillaume; Tamura, Takao; Pepin, Thomas; Waddell, James; Woods, Jerry; Robinson, Chris; Tian, Kehan; Johnson, Richard; Halle, Scott; Kim, Ryoung-Han; Mclellan, Erin; Kato, Hirokazu; Scaduto, Anthony; Maier, Carl; Colburn, Matt; Dusa, Mircea V. · 2011