Numerical Analysis for the Application of Electric Current to Silicon Semiconducting Materials
- 期刊名称Japanese Journal of Applied Physics
- 作者Wang, Jong Hoe
- 卷第44卷
- 期第2期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小576.84KB
- 发表时间2005-2-8
- DOI10.1143/JJAP.44.820
- 页码820-823
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