Workfunction Tuning Using Various Impurities for Fully Silicided NiSi Gate
- 期刊名称Japanese Journal of Applied Physics
- 作者Sano, Kousuke; Hino, Masaki; Ooishi, Norihiro; Shibahara, Kentaro
- 卷第44卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小805.63KB
- 发表时间2005-6-10
- DOI10.1143/JJAP.44.3774
- 页码3774-3777
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