SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Critical dimension sensitivity to post-exposure bake temperature variations in EUV photoresists
- 作者Cain, Jason P.; Mackay, R. Scott; Naulleau, Patrick; Spanos, Costas J.
- 卷第5751卷
- 印刷ISSN0277-786X
- 文件大小611.99KB
- 发表时间2005
- DOI10.1117/12.600432
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