SPIE Proceedings [SPIE 2nd international Symposium on Advanced Optical Manufacturing and Testing Technologies - Xian, China (Wednesday 2 November 2005)] 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies - Fabrication of relief gratings on high photosensitive SiO 2 /ZrO 2 gel film by UV exposure
Xu, Xiang; Yang, Li; Wen, Shangming; Zhou, Bin; Liu, Chunze; Chen, Yaolong; Kley, Ernst-Bernhard; Xu, Chao; Wu, Guangming; Ni, Xingyuan; Shen, Jun
- 作者Xu, Xiang; Yang, Li; Wen, Shangming; Zhou, Bin; Liu, Chunze; Chen, Yaolong; Kley, Ernst-Bernhard; Xu, Chao; Wu, Guangming; Ni, Xingyuan; Shen, Jun
- 卷第6149卷
- 印刷ISSN0277-786X
- 文件大小324.56KB
- 发表时间2005
- DOI10.1117/12.674210