Resist Characteristics of Acryl Polymer with Methyl Acetal Protecting Group for 193nm Lithography

• 期刊名称Journal of Photopolymer Science and Technology
• 作者Shirai, Masamitsu; Matsumaru, Shogo; Takahashi, Ryusaku; Kasai, Kohei; Kinoshita, Yohei; Hada, Hideo; Shirai, Masamitsu
• 卷第18卷
• 期第3期
• 印刷ISSN0914-9244
• 电子ISSN1349-6336
• 文件大小404.31KB
• 发表时间2005
• DOI10.2494/photopolymer.18.393
• 页码393-398