Electrical properties of high-k HfO2 films on Si1−xGex substrates

• 作者Tae Joo Park; Seong Keun Kim; Jeong Hwan Kim; Jaehoo Park; Moonju Cho; Suk Woo Lee; Sug Hun Hong; Cheol Seong Hwang
• 卷第80卷
• 印刷ISSN0167-9317
• 文件大小398.99KB
• 发表时间2005
• DOI10.1016/j.mee.2005.04.072
• 页码222-225