Doping of β-FeSi2 films with boron and arsenic by sputtering and its application for optoelectronic devices
Zhengxin Liu; Masato Osamura; Teruhisa Ootsuka; Shinan Wang; Yasuhiro Fukuzawa; Yasuhito Suzuki; Ryo Kuroda; Takahiro Mise; Naotaka Otogawa; Yasuhiko Nakayama; Hisao Tanoue; Yunosuke Makita
- 作者Zhengxin Liu; Masato Osamura; Teruhisa Ootsuka; Shinan Wang; Yasuhiro Fukuzawa; Yasuhito Suzuki; Ryo Kuroda; Takahiro Mise; Naotaka Otogawa; Yasuhiko Nakayama; Hisao Tanoue; Yunosuke Makita
- 卷第27卷
- 期第5期
- 印刷ISSN0925-3467
- 文件大小354.34KB
- 发表时间2005
- DOI10.1016/j.optmat.2004.08.040
- 页码942-947