[IEEE 2006 IEEE International Conference on IC Design and Technology - Padova, Italy ()] 2006 IEEE International Conference on IC Design and Technology - A scalable Stacked Gate NOR/NAND Flash Technology compatible with high-k and metal gates for sub 45nm generations

de Vos, J.; Haspeslagh, L.; Demand, M.; Devriendt, K.; Wellekens, D.; Beckx, S.; van Houdt, J.

作者de Vos, J.; Haspeslagh, L.; Demand, M.; Devriendt, K.; Wellekens, D.; Beckx, S.; van Houdt, J.
文件大小2298.80KB
发表时间2006
DOI10.1109/icicdt.2006.220783
页码1-4

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