Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films
- 作者Jaan Aarik; Aleks Aidla; Aarne Kasikov; Hugo Mändar; Raul Rammula; Väino Sammelselg
- 卷第252卷
- 期第16期
- 印刷ISSN0169-4332
- 文件大小276.57KB
- 发表时间2006
- DOI10.1016/j.apsusc.2005.07.067
- 页码5723-5734