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Improving the robustness of a partial least squares (PLS) model based on pure component selectivity analysis and range optimization: Case study for the analysis of an etching solution containing hydrogen peroxide

Improving the robustness of a partial least squares (PLS) model based on pure component selectivity analysis and range optimization: Case study for the analysis of an etching solution containing hydrogen peroxide

Youngbok Lee; Hoeil Chung; Mark A. Arnold

作者Youngbok Lee; Hoeil Chung; Mark A. Arnold
卷第572卷
期第1期
印刷ISSN0003-2670
文件大小610.06KB
发表时间2006
DOI10.1016/j.aca.2006.05.019
页码93-101

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