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Influence of substrate properties and annealing temperature on the stress state of magnetron sputtered tungsten thin films

Influence of substrate properties and annealing temperature on the stress state of magnetron sputtered tungsten thin films

J. C. Oliveira; A. Cavaleiro

作者J. C. Oliveira; A. Cavaleiro
文件大小374.82KB
发表时间2006
DOI10.1116/1.2348643

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