Composition, structure and nanomechanical properties of C–Si–N thin films deposited by ion implantation assisted plasma beam CVD

• 作者A. Tóth; M. Mohai; T. Ujvári; I. Bertóti
• 卷第200卷
• 印刷ISSN0257-8972
• 文件大小174.31KB
• 发表时间2006
• DOI10.1016/j.surfcoat.2005.11.068
• 页码6420-6424