Crystallization of HWCVD amorphous silicon thin films at elevated temperatures

• 作者Theo F.G. Muller; Dirk Knoesen; Chris Arendse; Ryno Swanepoel; Sylvain Halindintwali; Chris Theron
• 卷第501卷
• 印刷ISSN0040-6090
• 文件大小157.12KB
• 发表时间2006
• DOI10.1016/j.tsf.2005.07.133
• 页码98-101