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New growth approach of high-quality oxide thin films for future device applications: independent control of supersaturation and migration

New growth approach of high-quality oxide thin films for future device applications: independent control of supersaturation and migration

K. Endo; P. Badica; H. Sato; H. Akoh
  • 作者K. Endo; P. Badica; H. Sato; H. Akoh
  • 文件大小742.84KB
  • 发表时间2006
  • DOI10.1088/0953-2048/19/5/S12
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