Chemomechanical Nanolithography: Nanografting on Silicon and Factors Impacting Linewidth
- 期刊名称Journal of Nanoscience and Nanotechnology
- 作者Lee, Michael V.; Hoffman, Melinda Tonks; Barnett, Katherine; Geiss, John-Mark; Smentkowski, Vincent S.; Linford, Matthew R.; Davis, Robert C.
- 卷第6卷
- 期第6期
- 印刷ISSN1533-4880
- 电子ISSN0000-0000
- 文件大小488.54KB
- 发表时间2006-06-01
- DOI10.1166/jnn.2006.220
- 页码1639-1643
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