Depth Profile Analysis of Plasma-cured Multi Layer Resist
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Okumura, Haruki; Matsunobu, Takeshi; Matsuda, Keiko; Ono, Yoshiharu; Ishibashi, Takeo; Hanawa, Tetsuro; Tadokoro, Masahiro; Yoshikawa, Kazunori; Yonekura, Kazumasz; Fujii, Yasushi; Tanaka, Takeshi
- 卷第19卷
- 期第3期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小1959.42KB
- 发表时间2006
- DOI10.2494/photopolymer.19.379
- 页码379-384
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