Effect of microstructures on the electrical and optoelectronic properties of nanocrystalline Ta–Si–N thin films by reactive magnetron cosputtering

• 作者C.K. Chung; T.S. Chen
• 卷第57卷
• 期第7期
• 印刷ISSN1359-6462
• 文件大小336.87KB
• 发表时间2007
• DOI10.1016/j.scriptamat.2007.06.011
• 页码611-614