Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations of the main free radicals Si(CH3)1,2,3, and H2Si(CH3) produced in a microwave discharge sustained in an Ar–Si(CH3)4 gas mixture
J.L. Jauberteau; I. Jauberteau; J. Aubreton
- 作者J.L. Jauberteau; I. Jauberteau; J. Aubreton
- 卷第266卷
- 印刷ISSN1387-3806
- 文件大小983.85KB
- 发表时间2007
- DOI10.1016/j.ijms.2007.06.009
- 页码15-24