Nanofabrication on a Si surface by slow highly charged ion impact

Masahide Tona; Hirofumi Watanabe; Satoshi Takahashi; Nobuyuki Nakamura; Nobuo Yoshiyasu; Makoto Sakurai; Toshifumi Terui; Shinro Mashiko; Chikashi Yamada; Shunsuke Ohtani

作者Masahide Tona; Hirofumi Watanabe; Satoshi Takahashi; Nobuyuki Nakamura; Nobuo Yoshiyasu; Makoto Sakurai; Toshifumi Terui; Shinro Mashiko; Chikashi Yamada; Shunsuke Ohtani
卷第256卷
期第1期
印刷ISSN0168-583X
文件大小430.54KB
发表时间2007
DOI10.1016/j.nimb.2006.12.057
页码543-546

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Nanofabrication on a Si surface by slow highly charged ion impact