发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Critical Dimension Uniformity Via Real-Time Photoresist Thickness Control

Critical Dimension Uniformity Via Real-Time Photoresist Thickness Control

Weng Khuen Ho, ; Tay, A.; Ming Chen, ; Jun Fu, ; Haijing Lu, ; Xuechuan Shan,

期刊名称IEEE Transactions on Semiconductor Manufacturing
作者Weng Khuen Ho, ; Tay, A.; Ming Chen, ; Jun Fu, ; Haijing Lu, ; Xuechuan Shan,
卷第20卷
期第4期
印刷ISSN0894-6507
电子ISSN1558-2345
文件大小780.33KB
发表时间2007-11
DOI10.1109/tsm.2007.907610
页码376-380

← 返回【学霸图书馆】主页